Role of Critical Processing Parameters on Fundamental Phenomena and Characterizations of DC Argon Glow Discharge

Journal of Optoelectronical Nanostructures

مقاله 4، دوره 7، شماره 3 - شماره پیاپی 27، آبان 2022، صفحه 67-91   

نوع مقاله: Articles

شناسه دیجیتال (DOI): 10.30495/jopn.2022.29878.1255

نویسندگان

Maryam Shakiba^{* 1}؛ Mohsen Shakiba²

¹1Assistant Professor, Department of Electrical and Computer Engineering, Jundi-Shapur University of Technology

²2Assistant Professor, Department of Electrical and Computer Engineering, Jundi-Shapur University of Technology

تاریخ دریافت: 07 بهمن 1400،  تاریخ بازنگری: 04 مرداد 1401،  تاریخ پذیرش: 22 مرداد 1401 

چکیده

Given the significance of carefully analyzing
the critical range for processing parameters in a
sputtering system prior to experiments, as well as their
effect on the quality of the deposited thin film, this
crucial subject has been simulated and researched in this
research. Argon glow discharge conditions were obtained
by altering essential processing factors such as electrode
spacing, working pressure, and DC voltage delivered to
the electrodes. The effect of changing these processing
parameters on the potential difference and electric field
profiles, ion- and electron-density, ion- and electronkinetic
energy, and cross-section of fundamental
processes has been investigated to study the deposition
rate and microstructural characteristics of thin films.
Furthermore, the cross-section of fundamental ions-andelectron
collision processes like ionization, elastic
scattering, excitation, and charge exchange has been
investigated.

کلیدواژه‌ها

Argon glow discharge؛ Electrodes distance؛ Working pressure؛ Applied power

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